JPH0344855U - - Google Patents

Info

Publication number
JPH0344855U
JPH0344855U JP10569589U JP10569589U JPH0344855U JP H0344855 U JPH0344855 U JP H0344855U JP 10569589 U JP10569589 U JP 10569589U JP 10569589 U JP10569589 U JP 10569589U JP H0344855 U JPH0344855 U JP H0344855U
Authority
JP
Japan
Prior art keywords
container
plasma
sputter
ion source
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10569589U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0722843Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989105695U priority Critical patent/JPH0722843Y2/ja
Publication of JPH0344855U publication Critical patent/JPH0344855U/ja
Application granted granted Critical
Publication of JPH0722843Y2 publication Critical patent/JPH0722843Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP1989105695U 1989-09-08 1989-09-08 プラズマスパッタ型負イオン源 Expired - Fee Related JPH0722843Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989105695U JPH0722843Y2 (ja) 1989-09-08 1989-09-08 プラズマスパッタ型負イオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989105695U JPH0722843Y2 (ja) 1989-09-08 1989-09-08 プラズマスパッタ型負イオン源

Publications (2)

Publication Number Publication Date
JPH0344855U true JPH0344855U (en]) 1991-04-25
JPH0722843Y2 JPH0722843Y2 (ja) 1995-05-24

Family

ID=31654456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989105695U Expired - Fee Related JPH0722843Y2 (ja) 1989-09-08 1989-09-08 プラズマスパッタ型負イオン源

Country Status (1)

Country Link
JP (1) JPH0722843Y2 (en])

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915899A (en]) * 1972-06-08 1974-02-12
JPS5842149A (ja) * 1981-09-04 1983-03-11 Jeol Ltd セシウムイオン源
JPS5971235A (ja) * 1982-10-15 1984-04-21 Hitachi Ltd イオン源

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915899A (en]) * 1972-06-08 1974-02-12
JPS5842149A (ja) * 1981-09-04 1983-03-11 Jeol Ltd セシウムイオン源
JPS5971235A (ja) * 1982-10-15 1984-04-21 Hitachi Ltd イオン源

Also Published As

Publication number Publication date
JPH0722843Y2 (ja) 1995-05-24

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees